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Optics/Optic Communication Industry   »  Oxide Materials
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Oxide Materials
Chemical formula Specification/mm Melting point/℃ Evaporator source Refractive index Transparent band Use
Formula Preduct Size melting
point
Evaporatio
source
Refractive index
at550nm
The transparent
band
Application
SiO2 1-2/1-3/φ2*2/
φ3*3 etc.
1700 E 1.46 200-9000nm  
Nb2O5 1-2/1-3 etc. 1530 E 2.3 350-9000nm Antireflection film, interference filter
Ta2O5  1-3/Φ90*12t etc. 1800 RE,RS 2.1 350-9000nm Antireflection film, interference filter
ZrO2 φ18*10t/φ18*7t etc. 2715 E 2.05 250-9000nm Antireflection film, multilayer film, decorative film
TiO2 1-2/1-3 etc. 1850±20 RE,RS 2.3 360-9000nm Antireflection film, laser multilayer film, optical splitter, heat reflector
HfO2 1-3/1-5 etc. 2812 E,RS 2.15 200-9000nm Composite film
Ti3O5  1-3 etc. 1850 RE,RS 2.3 400-12000nm Antireflection film, optical filter
Al2O3  1-3 etc. 2020 E,B(W) 1.54 170-9000nm Antireflection film, multilayer film, interference film
WO3  1-3 etc. 1473 E,B(W) 1.7 360-10000nm Protective film, functional film
CeO2  1-5 etc. 2727 E,B(W) 2.2 400-12000nm Antireflection film
Cr2O3  1-3 etc. 2275 E 2.1 600-8000nm Bonding accelerant materials, plastic substrate coating film, color/sunscreen coating film
MgO  1-3/3-5 etc. 2852 E,B(W,Ta) 1.7 200-8000nm Laser coating, bonding accelerant materials
SiO 1-2/2-4 etc. 1700 B(W,Ta,Mo) 1.8-1.9 400-9000nm Beam splitter, color/sunscreen coating film
TiO 1-3/3-5 etc. 1750 RE,RS 1.9-2.3 400-12000nm  
Y2O3  1-3/3-5 etc. 2410 E 1.87 300-12000nm  
Ti2O3  1-3 etc. 2130 RE,RS 1.9-2.3 400-12000nm  
SnO2  1-3 etc. 1127 E,B(W) 2.0-2.1    
ZnO  1-3 etc. 1975 E,B(W,Mo) 2.1 350-20000nm  
Sb2O3  1-3 etc. 656 B(Ta) 2.3 300-1000nm