Oxide Materials | ||||||
Chemical formula | Specification/mm | Melting point/℃ | Evaporator source | Refractive index | Transparent band | Use |
Formula | Preduct Size | melting point |
Evaporatio source |
Refractive index at550nm |
The transparent band |
Application |
SiO2 | 1-2/1-3/φ2*2/ φ3*3 etc. |
1700 | E | 1.46 | 200-9000nm | |
Nb2O5 | 1-2/1-3 etc. | 1530 | E | 2.3 | 350-9000nm | Antireflection film, interference filter |
Ta2O5 | 1-3/Φ90*12t etc. | 1800 | RE,RS | 2.1 | 350-9000nm | Antireflection film, interference filter |
ZrO2 | φ18*10t/φ18*7t etc. | 2715 | E | 2.05 | 250-9000nm | Antireflection film, multilayer film, decorative film |
TiO2 | 1-2/1-3 etc. | 1850±20 | RE,RS | 2.3 | 360-9000nm | Antireflection film, laser multilayer film, optical splitter, heat reflector |
HfO2 | 1-3/1-5 etc. | 2812 | E,RS | 2.15 | 200-9000nm | Composite film |
Ti3O5 | 1-3 etc. | 1850 | RE,RS | 2.3 | 400-12000nm | Antireflection film, optical filter |
Al2O3 | 1-3 etc. | 2020 | E,B(W) | 1.54 | 170-9000nm | Antireflection film, multilayer film, interference film |
WO3 | 1-3 etc. | 1473 | E,B(W) | 1.7 | 360-10000nm | Protective film, functional film |
CeO2 | 1-5 etc. | 2727 | E,B(W) | 2.2 | 400-12000nm | Antireflection film |
Cr2O3 | 1-3 etc. | 2275 | E | 2.1 | 600-8000nm | Bonding accelerant materials, plastic substrate coating film, color/sunscreen coating film |
MgO | 1-3/3-5 etc. | 2852 | E,B(W,Ta) | 1.7 | 200-8000nm | Laser coating, bonding accelerant materials |
SiO | 1-2/2-4 etc. | 1700 | B(W,Ta,Mo) | 1.8-1.9 | 400-9000nm | Beam splitter, color/sunscreen coating film |
TiO | 1-3/3-5 etc. | 1750 | RE,RS | 1.9-2.3 | 400-12000nm | |
Y2O3 | 1-3/3-5 etc. | 2410 | E | 1.87 | 300-12000nm | |
Ti2O3 | 1-3 etc. | 2130 | RE,RS | 1.9-2.3 | 400-12000nm | |
SnO2 | 1-3 etc. | 1127 | E,B(W) | 2.0-2.1 | ||
ZnO | 1-3 etc. | 1975 | E,B(W,Mo) | 2.1 | 350-20000nm | |
Sb2O3 | 1-3 etc. | 656 | B(Ta) | 2.3 | 300-1000nm |
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